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MM-400/800LM NIKON日本尼康MM-400/800LM測量顯微鏡

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  • 公司名稱 北京新卓儀器有限公司
  • 品牌
  • 型號 MM-400/800LM
  • 所在地 北京市
  • 廠商性質(zhì) 代理商
  • 更新時間 2015/12/11 15:00:00
  • 訪問次數(shù) 762

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NIKON日本尼康MM-400/800LM測量顯微鏡

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NIKON日本尼康MM-400/800LM測量顯微鏡

Nikon is proud to present the MM-400/800 series of Measuring Microscopes, which incorporate key performance featuresexpected in an advanced next generation measuring microscope:

  • Greater Accuracy
  • Digital Imaging and Vision Processing Metrology
  • Larger Stage for Increased Workpiece Handling
  • Non Contact Z-height Measurements
  • Coordination with Data Processing Systems DP-E1

10 main Bodies Avbailable for different applications

For Large Stroke Stage (Max, 300mm x 200mm x 200mm)

MM-800/LM: Motorized Z Axis

MM-800/L: Built-in Z Linear Scale

MM-800/: 2 axes measurement model

MM-800/S: For 3rd Party DRO

MM-800/SL: For 3rd Party DRO with Built-in Z Linear Scale

For Smaller Stroke Stage (Max, 150mm x 100mm x 150mm)

MM-400/LM: Motorized Z Axis

MM-400/L: Built-in Z Linear Scale

MM-400/: 2 axes measurement model

MM-400/S: For 3rd Party DRO

MM-400/SL: For 3rd Party DRO with Built-in Z Linear Scale

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Measuring Microscope Features

MM-400/800 Series

New 300mm x 200mm Stage

Add body strength enables the use of larger stages, such as the newly developed PS12x8C stages, allowing for larger workpieces.

MM Controller Backpack Interface

Illumination, X/Y stage and Z data can be connected to the MM Controller as an interface to an external computer running E-Max software for data processing and system control.

All White LED Illuminators

High-intensity white LED illuminator is provided as standard for brightfield use . This illuminator feature no bulb replacement and constant color temperature, enabling measurement with high-precision and efficiency.

Non-Contact Height Measurement Technology FA Head TTL Laser AF for Universal Epi-Illuminator.

TTL Laser AF (Universal Type) 
This Laser AF system features a 0.5 second focusing speed with a repeatability as high as 0.5µm.

Focusing Aid (FA)
The newly developed split-prism Focusing Aid(FA) delivers sharp patterns to allow accurate focusing during Z-axis measurements.
Measurements errors due to differences in the depth of focus of different objectives are minimized.


Laser AF Tracking on FPC


Focused


Front focus


Rear focus

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Motorized Z-axis & Microscopic Observation Mode Switchhover

High Power Microscopic Model with Universal Epi-Illuminator

These "Universal" models combine a measuring stand with the best of Nikon's metallurgicalmicroscope components for high resolution imaging and critical measurements. Featuring thefull range of Nikon advanced LU objectives and microscopy techniques including: brightfield,darkfield, DIC contrast, polarizing and epi-fluorescence. Up to five objectives may bemounted on the nosepiece. Moreover, important controls in the microscope-e.g. Z-axismovement, focusing and illumination switchover-have been automated or motorized tostreamline imaging operations such as digital image capture, digital field-of-viewmeasurement and data storage.

Applications:

Semiconductor packages, Bonding placement, Loop height, FPD panel (LCM) MEMS, Wafer level CSP, HDD slider


Metalized Patterns of FPC


FFD - Cell Process


CCD


Color Filter


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